Nano imprint lithography is the next generation process technology. This simple and low-cost fabrication technology enables nano-scale patterns. NTT-AT’s high refractive index, UV-curable nano imprint lithography resins provide highly functional fine patterns with high accuracy.
This series’ high refractive index (RI) helps to miniaturize optical components. Resin type #18210 features a refractive index of more than 1.7 and contains solvent, good for creating a thin film (<1 µm). Solvent-free resin type #18247 enables to produce thicker layers (>2 to 3 µm) and can create nano-size patterns without a pre-baking process to evaporate the solvent. This product maintains a high refractive index of 1.689 to 1.765, depending on the light’s wavelength, keeping a high transparency in the visible wavelength range by using non-organic fillers.
With the recent increase in the refractive index of glass for AR/VR, aimed at expanding the field of view, the demand for resins to match this higher RI is also increasing. Just recently, NTT-AT has developed new 1.8 and 1.9 refractive index resins with high transparency and good nanoimprintability, able to fabricate a uniform thin film by spin coating. These resins are expected to contribute to the improvement of the flexibility in optical design.
NTT-AT uses high-precision refractive index control technology in the manufacture of optical adhesives to increase the concentration of high-refractive-index inorganic nanofillers and achieve high refractive index while optimizing the resin formulation. These resins are compatible with high-refractive index glasses and can create nano-patterns with a line width of 50 nm to 10 µm by nanoimprinting. They feature high light transmission in the wavelength range from 400 nm to 800 nm.